VESTANAT® TMDI (trimethyl-hexamethylene diisocyanate) is a linear, aliphatic diisocyanate. Using VESTANAT® TMDI yields flexible prepolymers with low viscosity. These can be further used in polyurethane dispersions, UV curing resins, or moisture curing formulations. TMDI based prepolymers have a good compatibility with solvents and other raw materials used in polyurethane chemistry and show a low tendency to crystalize.

VESTANAT® TMDI offers several advantages in polyurethane production due to its unique structure. With two primary reactive isocyanate groups, VESTANAT® TMDI is highly reactive.  Its linear structure results in low viscosity prepolymers and high flexibility in polyurethanes. Due to the branching with the three methyl groups, VESTANAT® TMDI based prepolymers are much less prone to crystallization, unlike the unbranched hexamethylene diisocyanate alternatives. This ensures stable quality. Its compatibility with solvents and raw materials enhances its versatility, making it ideal for UV curing resins and as a combination partner with other diisocyanates, for instance in the synthesis of PUDs. Additionally, TMDI provides high light stability and excellent weatherability.

Being an aliphatic diisocyanate VESTANAT® TMDI is used to manufacture light and weather resistant polyurethanes. In contrast to cycloaliphatic diisocyanates VESTANAT® TMDI imparts flexible segments to the resulting polyurethanes. Polyurethane resins based on VESTANAT® TMDI exhibit excellent compatibility. The property profile of the resins is highly influenced by the coreactants, e.g. the polyols. VESTANAT® TMDI is used for manufacturing of urethane modified resins for coatings. The characteristics of the resulting derivatives are high flexibility, excellent compatibility and low viscosity. Applications are e.g. heat curing systems, polyurethane dispersions and radiation curable urethane acrylics. Even proportional use of VESTANAT® TMDI in the diisocyanate moiety may lead to significant changes with regard to above mentioned properties.